The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2013
Filed:
Oct. 18, 2007
Yasushi Washio, Kawasaki, JP;
Kazuhide Uno, Kawasaki, JP;
Koichi Misumi, Kawasaki, JP;
Takahiro Senzaki, Kawasaki, JP;
Koji Saito, Kawasaki, JP;
Nobuko Ohgake, Kanagawa, JP;
Yasushi Washio, Kawasaki, JP;
Mitsuaki Ohgake, Kawasaki, JP;
Kazuhide Uno, Kawasaki, JP;
Koichi Misumi, Kawasaki, JP;
Takahiro Senzaki, Kawasaki, JP;
Koji Saito, Kawasaki, JP;
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;
Abstract
Disclosed are a chemically amplified positive-type photoresist composition for a thick film, a chemically amplified dry film for a thick film, and a method for producing a thick film resist pattern, all of which are capable of obtaining a satisfactory resist pattern with high sensitivity even on a substrate having a portion formed of copper on an upper surface thereof. The chemically amplified positive-type photoresist composition for a thick film comprises component (A) which includes at least one compound capable of producing an acid upon irradiation with an actinic ray or radiation, and component (B) which includes at least one resin whose alkali solubility increases by the action of an acid, in which the component (A) includes an onium fluorinated alkyl fluorophosphate having a specific structure.