The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2013
Filed:
Jan. 24, 2007
Tomoki Horita, Toyama, JP;
Kazuhiro Hirahara, Nagaoka, JP;
Hironobu Miya, Toyama, JP;
Atsuhiko Suda, Toyama, JP;
Hirohisa Yamazaki, Toyama, JP;
Tomoki Horita, Toyama, JP;
Kazuhiro Hirahara, Nagaoka, JP;
Hironobu Miya, Toyama, JP;
Atsuhiko Suda, Toyama, JP;
Hirohisa Yamazaki, Toyama, JP;
Hitachi Kokusai Electric Inc., Tokyo, JP;
Abstract
Disclosed is a substrate processing system, including: a processing chamber to process a substrate; a vaporizing unit to vaporize a material of liquid; a supply system to supply the processing chamber with gas of the material vaporized by the vaporizing unit; an exhaust system to exhaust an atmosphere in the processing chamber; and a cleaning liquid supply system to supply the vaporizing unit with cleaning liquid for cleaning a product deposited in the vaporizing unit, wherein the cleaning liquid supply system supplies at least two kinds of cleaning liquids into the vaporizing unit so that the product can be removed from the vaporizing unit by action of the two kinds of cleaning liquids on the product.