The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2013
Filed:
Mar. 30, 2011
Jun Sakuma, Kanagawa, JP;
Jun Sakuma, Kanagawa, JP;
Lasertec Corporation, Kanagawa, JP;
Abstract
The present invention provides a radiation source apparatus which can generate a DUV radiation beam having a wavelength of 193.4 nm efficiently. The radiation source apparatus according to the invention has first wavelength conversion means arranged to receive a first laser beam of a first fundamental wavelength and to generate a fourth-harmonic wavelength of the first fundamental wavelength, second wavelength conversion means arranged to receive the beam of the fourth-harmonic wavelength of the first fundamental wavelength (266 nm) and a second laser beam of a second fundamental wavelength and to sum-frequency mix the fourth-harmonic with the second fundamental wavelength radiation to generate a beam of second DUV radiation having a wavelength between approximately 232 nm and 237 nm, and third wavelength conversion means arranged to receive the beam of second DUV radiation and the third laser beam of a third fundamental wavelength and to sum-frequency mix the second DUV radiation with the third fundamental wavelength radiation to generate third DUV radiation having a wavelength between approximately 192.5 nm and 194.5 nm.