The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8502966 B1

PDF
Full Text
Expired
Date of Patent:
Aug. 06, 2013

Filed:

Oct. 05, 2012
Applicants:

Kenichi Shitara, Kamisato, JP;

Hiroshi Nakajima, Hiratsuka, JP;

Inventors:

Kenichi Shitara, Kamisato, JP;

Hiroshi Nakajima, Hiratsuka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides an apparatus and method which enable detecting a microscopic defect sensitively by efficiently collecting and detecting scattering light from a defect in a wider region without enlarging the apparatus. In the apparatus for inspecting a defect on a surface of a sample, including illumination means which irradiates a surface of a sample with laser, reflected light detection means which detects reflected light from the sample, and signal processing means which processes a detected signal and detecting a defect on the sample, the reflected light detection means is configured to include a scattering light detection unit which collects scattering light components of the reflected light from the sample by excluding specularly reflected light components by using an aspheric flannel lens and detecting the scattering light components.


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Shitara, Kenichi. (2013). Surface defect inspection method and apparatus (U.S. Patent No. 8502966). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8502966

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