The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2013
Filed:
Jul. 22, 2011
Kartik Santhanam, Milpitas, CA (US);
Martin A. Hilkene, Gilroy, CA (US);
Manoj Vellaikal, Sunnyvale, CA (US);
Mark R. Lee, Park City, UT (US);
Matthew D. Scotney-castle, Morgan Hill, CA (US);
Peter I. Porshnev, Poway, CA (US);
Kartik Santhanam, Milpitas, CA (US);
Martin A. Hilkene, Gilroy, CA (US);
Manoj Vellaikal, Sunnyvale, CA (US);
Mark R. Lee, Park City, UT (US);
Matthew D. Scotney-Castle, Morgan Hill, CA (US);
Peter I. Porshnev, Poway, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods and apparatus for processing a substrate are provided herein. In some embodiments, a method of doping a substrate may include forming a dopant region on a substrate by implanting one or more dopant elements into the dopant region of the substrate using a plasma doping process; forming a cap layer atop the dopant region; annealing the dopant region after forming the cap layer; and removing the cap layer after annealing the dopant region.