The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2013
Filed:
Sep. 23, 2011
Hyun-yong Cho, Uiwang-si, KR;
Min-kook Chung, Uiwang-si, KR;
Ji-young Jeong, Uiwang-si, KR;
Jong-hwa Lee, Uiwang-si, KR;
Yong-sik Yoo, Uiwang-si, KR;
Jeong-woo Lee, Uiwang-si, KR;
Hwan-sung Cheon, Uiwang-si, KR;
Soo-young Kim, Seongnam-si, KR;
Young-ho Kim, Yongin-si, KR;
Jae-hyun Kim, Yongin-si, KR;
Su-min Park, Seoul, KR;
Hyun-Yong Cho, Uiwang-si, KR;
Min-Kook Chung, Uiwang-si, KR;
Ji-Young Jeong, Uiwang-si, KR;
Jong-Hwa Lee, Uiwang-si, KR;
Yong-Sik Yoo, Uiwang-si, KR;
Jeong-Woo Lee, Uiwang-si, KR;
Hwan-Sung Cheon, Uiwang-si, KR;
Soo-Young Kim, Seongnam-si, KR;
Young-Ho Kim, Yongin-si, KR;
Jae-Hyun Kim, Yongin-si, KR;
Su-Min Park, Seoul, KR;
Cheil Industries Inc., Gum-si, KR;
Abstract
Disclosed is a positive photosensitive resin composition that includes (A) a polybenzoxazole precursor including a repeating unit represented by the following Chemical Formula 1; (B) a photosensitive diazoquinone compound; (C) a silane compound; (D) a phenol compound; and (E) a solvent. In the above Chemical Formula 1, each substituent is the same as defined in the specification.