The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 2013
Filed:
Sep. 30, 2003
Applicant:
William W. Volk, San Francisco, CA (US);
Inventor:
William W. Volk, San Francisco, CA (US);
Assignee:
KLA-Tencor Corporation, Milpitas, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of inspecting a mask, where a structure on the mask is optically imaged at a resolution specified by a criteria set including at least one of a method by which the structure was formed, a tolerance, and a structure type, to produce an optical image. The optical image is compared to a baseline image, and the differences between the optical image and the baseline image are identified. The differences are compared to a threshold value, and any differences that exceed the threshold value are flagged as defects.