The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2013
Filed:
Apr. 03, 2012
Ming Cai, Hopewell Junction, NY (US);
Aimin Xing, Fishkill, NY (US);
Chandra Reddy, LeGrangeville, NY (US);
Ming Cai, Hopewell Junction, NY (US);
Aimin Xing, Fishkill, NY (US);
Chandra Reddy, LeGrangeville, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Global Foundries, Inc., Grand Cayman, KY;
Abstract
A first liner and a second liner are formed such that a peripheral portion of the second liner overlies a peripheral portion of the first liner. A photoresist layer is applied and patterned such that a sidewall of a patterned photoresist layer overlies an overlapping peripheral portion of the second liner An isotropic dry etch is performed to laterally etch the overlapping peripheral portion of the second liner from below the patterned photoresist layer. The patterned photoresist is subsequently removed, and a structure without an overlap of the first and second liners is provided.