The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 23, 2013

Filed:

Nov. 11, 2011
Applicants:

Blake Koelmel, Palo Alto, CA (US);

Alexander N. Lerner, San Jose, CA (US);

Joseph M. Ranish, San Jose, CA (US);

Kedarnath Sangam, Sunnyvale, CA (US);

Khurshed Sorabji, San Jose, CA (US);

Inventors:

Blake Koelmel, Palo Alto, CA (US);

Alexander N. Lerner, San Jose, CA (US);

Joseph M. Ranish, San Jose, CA (US);

Kedarnath Sangam, Sunnyvale, CA (US);

Khurshed Sorabji, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B65B 31/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

An apparatus and method for supporting, positioning and rotating a substrate are provided. In one embodiment, a support assembly for supporting a substrate includes an upper base plate and a lower base plate. The substrate is floated on a thin layer of air over the upper base plate. A positioning assembly includes a plurality of air bearing edge rollers or air flow pockets used to position the substrate in a desired orientation inside above the upper base plate. A plurality of slanted apertures or air flow pockets are configured in the upper base plate for flowing gas therethrough to rotate the substrate to ensure uniform heating during processing.


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