The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 16, 2013

Filed:

Jun. 07, 2011
Applicants:

Gal Shabtay, Tel-Aviv, IL;

Ephraim Goldenberg, Tel-Aviv, IL;

Pavel Reshidko, Tel-Aviv, IL;

Noy Cohen, Tel-Aviv, IL;

Inventors:

Gal Shabtay, Tel-Aviv, IL;

Ephraim Goldenberg, Tel-Aviv, IL;

Pavel Reshidko, Tel-Aviv, IL;

Noy Cohen, Tel-Aviv, IL;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02B 9/60 (2006.01);
U.S. Cl.
CPC ...
Abstract

A lens system is provided that comprises an enhanced depth of field based on a uniform or near uniform relative illumination via a lens with a large distortion. The distortion can be corrected with image processing equipment. The lens system can comprise an aperture stop and a group of lens, wherein there can be about five lenses in the group of lenses. The lens system is designed for relative illumination such that the light distribution over the lens system is substantially uniform.


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