The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2013
Filed:
May. 29, 2009
Edward Christopher Hagen, Las Vegas, NV (US);
Bernard Timothy Meehan, Iii, Las Vegas, NV (US);
Edward Christopher Hagen, Las Vegas, NV (US);
Bernard Timothy Meehan, III, Las Vegas, NV (US);
National Security Technologies, LLC, Las Vegas, NV (US);
Abstract
A dense plasma focus device is disclosed as having an anode with a non-constant radius and a cathode coupled to the anode, the cathode also having a non-constant radius. The anode and/or the cathode may be tapered. In addition, a ratio of the non-constant radius of the anode and the non-constant radius of the cathode may be held constant along the length of the dense plasma focus device in order to maintain constant inductance. Alternatively, the inductance may be varied by varying the ratio of the anode and cathode radii along the length of the dense plasma focus device.