The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2013
Filed:
Jul. 22, 2011
Frank Holsteyns, Kortenberg, BE;
Alexander Lippert, Villach, AT;
Christian Degel, Blieskastel, DE;
Anette Jakob, St. Wendel, DE;
Franz Josef Becker, St. Ingbert, DE;
Frank Holsteyns, Kortenberg, BE;
Alexander Lippert, Villach, AT;
Christian Degel, Blieskastel, DE;
Anette Jakob, St. Wendel, DE;
Franz Josef Becker, St. Ingbert, DE;
Lam Research AG, Villach, AT;
Fraunhofer-Gesellschaft zur Forderung der angewandten Forschung e.V., Munich, DE;
Abstract
A device and method for treating the surface of a semiconductor wafer provides a treatment fluid in the form of a dispersion of gas bubbles in a treatment liquid generated at acoustic pressures less than those required to induce cavitation in the treatment liquid. A resonator supplies ultrasonic or megasonic energy to the treatment fluid and is configured to create an interference pattern in the treatment fluid comprising regions of pressure amplitude minima and maxima at an interface of the treatment fluid and the semiconductor wafer.