The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2013
Filed:
Jun. 26, 2009
Xia LI, San Diego, CA (US);
Wei Zhao, San Diego, CA (US);
David Bang, San Diego, CA (US);
Yu Cao, San Diego, CA (US);
Seung H. Kang, San Diego, CA (US);
Matthew Nowak, San Diego, CA (US);
Xia Li, San Diego, CA (US);
Wei Zhao, San Diego, CA (US);
David Bang, San Diego, CA (US);
Yu Cao, San Diego, CA (US);
Seung H. Kang, San Diego, CA (US);
Matthew Nowak, San Diego, CA (US);
QUALCOMM Incorporated, San Diego, CA (US);
Abstract
A computer program product estimates performance of a back end of line (BEOL) structure of a semiconductor integrated circuit (IC). Code executes on a computer to dynamically predict an electrical resistance of the BEOL structure based on input data specific to multiple layers of the BEOL structure. The BEOL structure can be a contact or a via. The layers of the contact/via include an inner filling material and an outer liner. The code accounts for a width scatter effect of the inner filling material, as well as a slope profile of the contact/via.