The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2013
Filed:
May. 14, 2011
Applicants:
Makoto Ezumi, Mito, JP;
Satoru Iwama, Hitachinaka, JP;
Junichi Kakuta, Hitachinaka, JP;
Takahiro Sato, Mito, JP;
Akira Ikegami, Suita, JP;
Inventors:
Makoto Ezumi, Mito, JP;
Satoru Iwama, Hitachinaka, JP;
Junichi Kakuta, Hitachinaka, JP;
Takahiro Sato, Mito, JP;
Akira Ikegami, Suita, JP;
Assignee:
Hitachi High-Technologies Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/28 (2013.01);
Abstract
As an aspect for realizing accurate observation, inspection, or measurement of the contact hole with large aspect ratio, a method and a device to scan a second electron beam after scanning a first electron beam to a sample to charge the sample are proposed wherein the beam diameter of the first electron beam is made larger than the beam diameter of the second electron beam.