The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2013
Filed:
Apr. 27, 2012
Fabrice Letertre, Meylan, FR;
Carlos Mazure, Bernin, FR;
Michael R. Krames, Los Altos, CA (US);
Melvin B. Mclaurin, Mountain View, CA (US);
Nathan F. Gardner, Sunnyvale, CA (US);
Fabrice Letertre, Meylan, FR;
Carlos Mazure, Bernin, FR;
Michael R. Krames, Los Altos, CA (US);
Melvin B. McLaurin, Mountain View, CA (US);
Nathan F. Gardner, Sunnyvale, CA (US);
Soitec, Bernin, FR;
Abstract
A method for relaxing a layer of a strained material. The method includes depositing a first low-viscosity layer on a first face of a strained material layer; bonding a first substrate to the first low-viscosity layer to form a first composite structure; subjecting the composite structure to heat treatment sufficient to cause reflow of the first low-viscosity layer so as to at least partly relax the strained material layer; and applying a mechanical pressure to a second face of the strained material layer wherein the second face is opposite to the first face and with the mechanical pressure applied perpendicularly to the strained material layer during at least part of the heat treatment to relax the strained material.