The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2013
Filed:
Dec. 19, 2011
Hyojin Yun, Gyeonggi-Do, KR;
Changeun Yoo, Gyeonggi-Do, KR;
Myung-sun Kim, Gyeonggi-Do, KR;
Soo-kyung Kim, Gyeonggi-Do, KR;
Kouji Nishikawa, Tokyo, JP;
Hirofumi Goto, Tokyo, JP;
Hidetoshi Miyamoto, Tokyo, JP;
Hyojin Yun, Gyeonggi-Do, KR;
Changeun Yoo, Gyeonggi-Do, KR;
Myung-Sun Kim, Gyeonggi-Do, KR;
Soo-Kyung Kim, Gyeonggi-Do, KR;
Kouji Nishikawa, Tokyo, JP;
Hirofumi Goto, Tokyo, JP;
Hidetoshi Miyamoto, Tokyo, JP;
Samsung Electronics Co., Ltd., Hwasung, KR;
JSR Corporation, Tokyo, JP;
Abstract
A compound synthesis method includes bonding a first compound to a substrate to form a first film. A second film is formed on the first film using an acid-transfer composition including (A) a polymer that includes a structural unit shown by a following formula (1) and a structural unit shown by a following formula (2), (B) a photoacid generator shown by a following formula (3), and (C) a sensitizer shown by a following formula (4). The second film is exposed to remove the protecting group from the first compound under an exposed area of the second film. An acid generated in the exposed area of the second film is transferred to the first film. The second film after being exposed is removed. A second compound is bonded to the first compound from which the protecting group has been removed.