The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2013
Filed:
Dec. 23, 2011
Daiju Shiono, Kawasaki, JP;
Tomoyuki Hirano, Kawasaki, JP;
Sanae Furuya, Kawasaki, JP;
Takahiro Dazai, Kawasaki, JP;
Hiroaki Shimizu, Kawasaki, JP;
Tsuyoshi Kurosawa, Kawasaki, JP;
Hideto Nito, Kawasaki, JP;
Tsuyoshi Nakamura, Kawasaki, JP;
Daiju Shiono, Kawasaki, JP;
Tomoyuki Hirano, Kawasaki, JP;
Sanae Furuya, Kawasaki, JP;
Takahiro Dazai, Kawasaki, JP;
Hiroaki Shimizu, Kawasaki, JP;
Tsuyoshi Kurosawa, Kawasaki, JP;
Hideto Nito, Kawasaki, JP;
Tsuyoshi Nakamura, Kawasaki, JP;
Tokyo Ohka Kogyo Co., Ltd., Kanagawa-ken, JP;
Abstract
A resist composition for immersion exposure including: a fluorine-containing polymeric compound (F) containing a structural unit (f1) having a base dissociable group and a structural unit (f2) represented by general formula (f2-1) (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W is a group represented by any one of general formulas (w-1) to (w-4)); a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid; and an acid generator component (B) that generates acid upon exposure.