The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2013
Filed:
Aug. 26, 2011
Jin Choi, Seoul, KR;
Byung-gook Kim, Seoul, KR;
Hee-bom Kim, Hwaseong-si, KR;
Sang-hee Lee, Yongin-si, KR;
Jin Choi, Seoul, KR;
Byung-gook Kim, Seoul, KR;
Hee-bom Kim, Hwaseong-si, KR;
Sang-hee Lee, Yongin-si, KR;
Abstract
A method of forming a semiconductor device can include determining a shot set including a plurality of shots, based on a final pattern used to form a mask. Shots included in the plurality shots can be classified as being in a first pass shot set or in a second pass shot set, where each can include a plurality of non-directly neighboring shots. A first pass exposure can be performed to radiate a reticle to provide the first pass shot set and a second pass exposure can be performed to radiate the reticle to provide the second pass shot set.