The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2013
Filed:
Jul. 29, 2011
Kazuyuki Iori, Kawasaki, JP;
Yukito Nakagawa, Kokubunji, JP;
Kazuyuki Iori, Kawasaki, JP;
Yukito Nakagawa, Kokubunji, JP;
Canon Anelva Corporation, Kawasaki-shi, JP;
Abstract
The present invention provides a plasma processing device and a plasma processing method that can easily adjust plasma density distribution while making the plasma density uniform, and a method of manufacturing an element including a substrate to be processed. In an embodiment of the present invention, the inside of a vacuum vessel () is divided by a grid () having communication holes into a plasma generation chamber () and a plasma processing chamber (). On the upper wall () of the plasma generation chamber (), magnetic coils () are arranged such that magnetic field lines within the vacuum vessel () point from the center of the vacuum vessel () to a side wall (), and, outside the side wall () of the plasma generation chamber (), ring-shaped permanent magnets () are arranged such that a polarity pointing to the inside of the vacuum vessel () is a north pole and a polarity pointing to the outside of the vacuum vessel () is a south pole.