The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 02, 2013

Filed:

Oct. 12, 2006
Applicants:

Daisuke Uenda, Osaka, JP;

Yukio Arimitsu, Osaka, JP;

Yoshio Terada, Osaka, JP;

Yasuhiro Amano, Osaka, JP;

Akihisa Murata, Osaka, JP;

Inventors:

Daisuke Uenda, Osaka, JP;

Yukio Arimitsu, Osaka, JP;

Yoshio Terada, Osaka, JP;

Yasuhiro Amano, Osaka, JP;

Akihisa Murata, Osaka, JP;

Assignee:

Nitto Denko Corporation, Ibaraki-shi, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 7/00 (2006.01); B32B 3/30 (2006.01); B32B 17/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

A cleaning sheet including a cleaning layer which has a microasperity shape having an arithmetic average roughness Ra of 0.05 μm or less and a maximum height Rz of 1.0 μm or less. Preferably, a substantial surface area of the cleaning layer per a flat surface of 1 mmis 150% or more of a substantial surface area of a silicon wafer mirror surface per a flat area of 1 mm. The cleaning sheet may be provided on at least one surface of a transfer member so that the transfer member has a cleaning function. When the cleaning sheet or the transfer member having a cleaning function is transferred in a substrate processing apparatus in place of a substrate to be processed therein, the cleaning sheet contacts and cleans a site of the substrate processing apparatus.


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