The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 25, 2013

Filed:

Jul. 27, 2011
Applicants:

Keiichi Masunaga, Joetsu, JP;

Satoshi Watanabe, Joetsu, JP;

Akinobu Tanaka, Joetsu, JP;

Inventors:

Keiichi Masunaga, Joetsu, JP;

Satoshi Watanabe, Joetsu, JP;

Akinobu Tanaka, Joetsu, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); G03F 7/32 (2006.01); C08F 26/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

A polymer is provided comprising recurring units having a N,N'-bis(alkoxymethyl)tetrahydropyrimidinone or N,N′-bis(hydroxymethyl)tetrahydropyrimidinone structure on a side chain. When a chemically amplified negative resist composition is formulated using the polymer and processed by lithography, a fine resist pattern can be formed with the advantages of improved LER and high resolution.


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