The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2013
Filed:
Jan. 20, 2011
Christian Dussarrat, Tokyo, JP;
Nicolas Blasco, Grenoble, FR;
Audrey Pinchart, Antony, FR;
Christophe Lachaud, Saint Michel sur Orge, FR;
Christian Dussarrat, Tokyo, JP;
Nicolas Blasco, Grenoble, FR;
Audrey Pinchart, Antony, FR;
Christophe Lachaud, Saint Michel sur Orge, FR;
Abstract
Methods of depositing a metal containing dielectric film on a substrate are disclosed. The metal containing dielectric film has the formula (MM) ON, wherein 0≦a<1, 0<b≦3, 0≦c≦1, Mrepresents a metal selected from (Hf) or (Zr); and Mrepresents a metal atom. The method generally uses an Mmetal containing precursor selected from: Zr(MeCp)(NMe), Zr(EtCp)(NMe), ZrCp(NMe), Zr(MeCp)(NEtMe), Zr(EtCp)(NEtMe), ZrCp(NEtMe), Zr(MeCp)(NEt), Zr(EtCp)(NEt), ZrCp(NEt), Zr(iPrCp)(NMe), Zr(tBuCp)(NMe), Hf(MeCp)(NMe), Hf(EtCp)(NMe), HfCp(NMe), Hf(MeCp)(NEtMe), Hf(EtCp)(NEtMe), HfCp(NEtMe), Hf(MeCp)(NEt), Hf(EtCp)(NEt), HfCp(NEt), Hf(iPrCp)(NMe), or Hf(tBuCp)(NMe).