The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2013
Filed:
Sep. 05, 2008
Shoubin Zhang, Sanda, JP;
Akifumi Mishima, Saitama, JP;
Shoubin Zhang, Sanda, JP;
Akifumi Mishima, Saitama, JP;
Mitsubishi Material Corporation, Tokyo, JP;
Abstract
A sputtering target for forming a ZrO—InObased protective film for an optical storage medium, has a component composition made of ZrInAOwhere 'A' represents one, two, or more of Si, Cr, Al, Ce, Ti, and Sn, 'a' represents an amount greater than 5 atomic percent and less than 23 atomic percent, “b” represents an amount greater than 12 atomic percent and less than 35 atomic percent, and “c” represents an amount greater than 0 and less than 30 atomic percent, wherein 90% or more of Zr that is included in the sputtering target for forming the protective film for the optical storage medium is in an oxidative product phase in which Zr and In are combined, and is dispersed in a base material of the target.