The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2013
Filed:
Nov. 22, 2011
Applicants:
Simon Su-horng Lin, Hsinchu, TW;
Chi-ming Yang, Hsian-San District, TW;
Chyi Shyuan Chern, Taipei, TW;
Chin-hsiang Lin, Hsinchu, TW;
Inventors:
Simon Su-Horng Lin, Hsinchu, TW;
Chi-Ming Yang, Hsian-San District, TW;
Chyi Shyuan Chern, Taipei, TW;
Chin-Hsiang Lin, Hsinchu, TW;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of depositing a metal film on a substrate with patterned features includes placing a substrate with patterned features into a photo-induced chemical vapor deposition (PI-CVD) process chamber. The method also includes depositing a metal film by PI-CVD to fill the patterned features from bottom up.