The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2013
Filed:
Dec. 20, 2010
Bhadri N. Varadarajan, Beaverton, OR (US);
Kevin M. Mclaughlin, Sherwood, OR (US);
Bart Van Schravendijk, Sunnyvale, CA (US);
Bhadri N. Varadarajan, Beaverton, OR (US);
Kevin M. McLaughlin, Sherwood, OR (US);
Bart van Schravendijk, Sunnyvale, CA (US);
Novellus Systems, Inc., Fremont, CA (US);
Abstract
A method for the ultraviolet (UV) treatment of carbon-containing low-k dielectric and associated apparatus enables process induced damage repair. The methods of the invention are particularly applicable in the context of damascene processing to recover lost low-k property of a dielectric damaged during processing, either pre-metallization, post-planarization, or both. UV treatments can include an exposure of the subject low-k dielectric to a constrained UV spectral profile and/or chemical silylating agent, or both.