The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 18, 2013

Filed:

Oct. 14, 2010
Applicants:

Chien-hsing Lee, Hsinchu County, TW;

Tsung-min Hsieh, Taipei County, TW;

Li-chi Tsao, Taichung, TW;

Jhyy-cheng Liou, Hsinchu County, TW;

Inventors:

Chien-Hsing Lee, Hsinchu County, TW;

Tsung-Min Hsieh, Taipei County, TW;

Li-Chi Tsao, Taichung, TW;

Jhyy-Cheng Liou, Hsinchu County, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01L 7/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

A MEMS structure includes a substrate, a structural dielectric layer, and a diaphragm. A structural dielectric layer is disposed over the substrate. The diaphragm is held by the structural dielectric layer at a peripheral end. The diaphragm includes multiple trench/ridge rings at a peripheral region surrounding a central region of the diaphragm. A corrugated structure is located at the central region of the diaphragm, surrounded by the trench/indent rings.


Find Patent Forward Citations

Loading…