The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 11, 2013

Filed:

Feb. 16, 2010
Applicant:

Takeshi Kurohori, Shizuoka, JP;

Inventor:

Takeshi Kurohori, Shizuoka, JP;

Assignee:

NuFlare Technology, Inc., Numazu-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G21K 5/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

Based on the pattern writing data input to an input unit, a control computerdivides a predetermined region on which writing is effected by an electron beaminto smaller regions each consisting of one or the same number of frames and determines the areal density of a pattern to be written on each smaller region. A drift compensation time interval determining unitthen determines the amount of change in pattern areal density between each two adjacent smaller regions, and groups the smaller regions in the predetermined region into region groups depending on whether or not the amount of change is greater than a predetermined value. A time profile for compensating for the drift of the electron beamis then determined for each region group.


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