The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2013
Filed:
Aug. 11, 2011
Chi-ta LU, Sanxing Township, Yilan County, TW;
Jia-guei Jou, New Taipei, TW;
Peng-ren Chen, Hsinchu, TW;
Dong-hsu Cheng, Tainan, TW;
Chi-Ta Lu, Sanxing Township, Yilan County, TW;
Jia-Guei Jou, New Taipei, TW;
Peng-Ren Chen, Hsinchu, TW;
Dong-Hsu Cheng, Tainan, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
The present disclosure provides for methods of reducing cycle time in data preparation. In one embodiment, a method includes receiving an initial integrated circuit (IC) design layout and an optical proximity correction (OPC)-processed initial IC design layout, and receiving a revised IC design layout. The method further includes comparing the revised IC design layout to the initial IC design layout to identify a difference region of the revised IC design layout from the initial IC design layout, performing an OPC on the difference region of the revised IC design layout, and merging the OPC-processed difference region of the revised IC design layout with the OPC-processed initial IC design layout.