The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2013
Filed:
Jun. 17, 2009
Franciscus Johannes Joseph Janssen, Eindhoven, NL;
Siebe Landheer, Eindhoven, NL;
Yücel Kök, Veldhoven, NL;
Marcel Beckers, Eindhoven, NL;
Ivo Adam Johannes Thomas, Son, NL;
Marcio Alexandre Cano Miranda, Eindhoven, NL;
Franciscus Johannes Joseph Janssen, Eindhoven, NL;
Siebe Landheer, Eindhoven, NL;
Yücel Kök, Veldhoven, NL;
Marcel Beckers, Eindhoven, NL;
Ivo Adam Johannes Thomas, Son, NL;
Marcio Alexandre Cano Miranda, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus of the immersion type is disclosed. In the apparatus, a plurality of heating and/or cooling devices are provided in the vicinity of the final element of the projection system, e.g. in a barrier member of a liquid handling system. The heating and/or cooling devices can be used, for example, to control temperature gradients in the final element of the projection system to control aberrations therein.