The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2013
Filed:
Jan. 18, 2012
Hikaru Sugita, Tokyo, JP;
Nobuji Matsumura, Toko, JP;
Daisuke Shimizu, Tokyo, JP;
Toshiyuki Kai, Tokyo, JP;
Tsutomu Shimokawa, Tokyo, JP;
Hikaru Sugita, Tokyo, JP;
Nobuji Matsumura, Toko, JP;
Daisuke Shimizu, Tokyo, JP;
Toshiyuki Kai, Tokyo, JP;
Tsutomu Shimokawa, Tokyo, JP;
JSR Corporation, Tokyo, JP;
Abstract
A pattern forming method includes providing and curing a under-layer film containing a radiation-sensitive acid generator which generates an acid upon exposure to radiation on a substrate. The under-layer film is irradiated with radiation through a mask to cause an acid to be selectively generated in an exposed area of the under-layer film. An upper-layer film which does not contain a radiation-sensitive acid generator and which contains a composition capable of polymerizing or crosslinking by an action of an acid is provided. A cured film is provided by polymerization or crosslinking selectively in an area of the upper-layer film corresponding to the exposed area of the under-layer film in which the acid has been generated. An area of the upper-layer film corresponding to an area of the under-layer film in which the acid has not been generated is removed.