The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2013
Filed:
Sep. 30, 2010
Daniel J. Coady, San Jose, CA (US);
Urs T. Duerig, Rueschlikon, CH;
Jane E. Frommer, San Jose, CA (US);
Kazuki Fukushima, San Jose, CA (US);
James L. Hedrick, San Jose, CA (US);
Armin W. Knoll, Rueschlikon, CH;
Daniel J. Coady, San Jose, CA (US);
Urs T. Duerig, Rueschlikon, CH;
Jane E. Frommer, San Jose, CA (US);
Kazuki Fukushima, San Jose, CA (US);
James L. Hedrick, San Jose, CA (US);
Armin W. Knoll, Rueschlikon, CH;
International Business Machines Corporation, Armonk, NY (US);
Abstract
The invention concerns a method for patterning a surface of a material. A substrate having a polymer film thereon is provided. The polymer is a selectively reactive polymer (e.g., thermodynamically unstable): it is able to unzip upon suitable stimulation. A probe is used to create patterns on the film. During the patterning, the film is locally stimulated for unzipping polymer chains. Hence, a basic idea is to provide a stimulus to the polymeric material, which in turn spontaneously decomposes e.g., into volatile constituents. For example, the film is thermally stimulated in order to break a single bond in a polymer chain, which is sufficient to trigger the decomposition of the entire polymer chain.