The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2013
Filed:
Dec. 15, 2008
Tuomas Koskelainen, Pirkkala, FI;
Tuomas Koskelainen, Pirkkala, FI;
Smartrac IP B.V., Amsterdam, NL;
Abstract
A method for manufacturing a component by etching, the component including a substrate and an electrically conductive line configuration supported by the substrate, the electrically conductive line configuration being formed by etching away locally an electrically conductive coating supported by the substrate. An etching mask is used to control locally removal and maintenance of the electrically conductive coating by using an etchant and it includes barrier material on at least one main area corresponding to the electrically conductive line configuration to be maintained during etching. The etching mask further includes at least one sub-area comprising barrier material, the sub-area being arranged at a distance from the edge of the main area. Etchant is applied on the component until areas of electrically conductive coating not protected by the main area of the etching mask and until the area of the electrically conductive coating protected by the sub-area of the etching mask has been substantially removed by the etchant.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile