The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2013
Filed:
Jun. 02, 2009
Gerardus Carolus Johannus Hofmans, Eindhoven, NL;
Bart Peter Bert Segers, Tessenderlo, BE;
Daan Maurtis Slotboom, Rhenen, NL;
Gerardus Carolus Johannus Hofmans, Eindhoven, NL;
Bart Peter Bert Segers, Tessenderlo, BE;
Daan Maurtis Slotboom, Rhenen, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A detection method for detecting a property of an extended pattern formed by at least one line generally extending in a first direction. The extended pattern is formed on a substrate or on a substrate table and preferably extends over a length of at least 50× the width of the line. The extended pattern is focus sensitive. The detection method includes moving the substrate table in a first direction and measuring along that first direction a property of the extended pattern. The property can be a result of a physical property of the extended pattern in a second direction perpendicular to the first direction. In a next step a calibration of the substrate table position can be derived from the measured position of the extended pattern.