The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2013
Filed:
Jun. 17, 2011
Ali Afzali-ardakani, Ossining, NY (US);
Jeffrey C. Hedrick, Montvale, NJ (US);
Mahmoud Khojasteh, Poughkeepsie, NY (US);
Young-hee Kim, Mohegan Lake, NY (US);
Ali Afzali-Ardakani, Ossining, NY (US);
Jeffrey C. Hedrick, Montvale, NJ (US);
Mahmoud Khojasteh, Poughkeepsie, NY (US);
Young-Hee Kim, Mohegan Lake, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A dielectric material layer is formed on a front surface of a photovoltaic device. A patterned PMMA-type-material-including layer is formed on the dielectric material layer, and the pattern is transferred into the top portion of the photovoltaic device to form trenches in which contact structures can be formed. In one embodiment, a blanket PMMA-type-material-including layer is deposited on the dielectric material layer, and is patterned by laser ablation that removes ablated portions of PMMA-type-material. The PMMA-type-material-including layer may also include a dye to enhance absorption of the laser beam. In another embodiment, a blanket PMMA-type-material-including layer may be deposited on the dielectric material layer and mechanically patterned to form channels therein. In yet another embodiment, a patterned PMMA-type-material-including layer is stamped on top of the dielectric material layer.