The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2013
Filed:
Sep. 20, 2011
Masanari Kajiwara, Kanagawa, JP;
Toshiya Kotani, Tokyo, JP;
Sachiko Kobayashi, Chiba, JP;
Hiromitsu Mashita, Kanagawa, JP;
Fumiharu Nakajima, Kanagawa, JP;
Masanari Kajiwara, Kanagawa, JP;
Toshiya Kotani, Tokyo, JP;
Sachiko Kobayashi, Chiba, JP;
Hiromitsu Mashita, Kanagawa, JP;
Fumiharu Nakajima, Kanagawa, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A pattern correcting method of an embodiment computes a distribution of pattern coverages on a design layout of a circuit pattern in the vicinity of a position that becomes an error pattern in a case where an on-substrate pattern is formed. Then, an area on the design layout in which a difference in the distribution of the pattern coverages becomes small by adding an addition pattern is set as an addition area. Next, addition pattern candidates to be added to the addition area are generated, an addition pattern to be added to the design layout is selected from the candidates on the basis of a predetermined selection criterion, and the addition pattern is added to the addition area.