The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2013
Filed:
Sep. 14, 2007
Willi Heintel, Aalen, DE;
Hagen Federau, Augsburg, DE;
Joachim Hartjes, Aalen, DE;
Harald Kirchner, Munich, DE;
Bernhard Geuppert, Aalen, DE;
Ulrich Bingel, Michelfeld, DE;
Tilman Schwertner, Aalen, DE;
Willi Heintel, Aalen, DE;
Hagen Federau, Augsburg, DE;
Joachim Hartjes, Aalen, DE;
Harald Kirchner, Munich, DE;
Bernhard Geuppert, Aalen, DE;
Ulrich Bingel, Michelfeld, DE;
Tilman Schwertner, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
There is provided an optical module for microlithography. The optical module includes an optical element and a retaining device for holding the optical element. The optical element has (a) a main extension plane, in which it defines a radial direction R and a circumferential direction U, and (b) a free optical diameter and an overrun in the region of its outer periphery. The retaining device contacts the optical element in the region of the overrun, and is formed and/or contacts the optical element in such a manner that the overrun ratio, calculated from the overrun related to a minimum overrun necessary for the production of the optical element, is at most 1.5.