The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2013
Filed:
Sep. 04, 2008
Applicants:
Tatsuya Sakai, Tokyo, JP;
Sanshiro Komiya, Fuchu, JP;
Naofumi Nomura, Fuchu, JP;
Inventors:
Assignee:
JSR Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C07F 15/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A diruthenium complex such as tetra(μ-formato)diruthenium(II,II) or tetra(μ-formato)(dehydrate)diruthenium(II,II), a material for chemical vapor deposition which comprises the complex, and a method of forming a ruthenium film from the material by chemical vapor deposition.
Sakai, Tatsuya. (2013). Diruthenium complex, and material and method for chemical vapor deposition (U.S. Patent No. 8440260). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8440260
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile