The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2013
Filed:
Feb. 14, 2008
Applicants:
Yuji Hagiwara, Kawagoe, JP;
Jonathan Joachim Jodry, Kawagoe, JP;
Satoru Narizuka, Saitama, JP;
Kazuhiko Maeda, Hino, JP;
Inventors:
Yuji Hagiwara, Kawagoe, JP;
Jonathan Joachim Jodry, Kawagoe, JP;
Satoru Narizuka, Saitama, JP;
Kazuhiko Maeda, Hino, JP;
Assignee:
Central Glass Company, Limited, Ube-shi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/038 (2006.01); G03C 1/675 (2006.01); G03C 1/73 (2006.01);
U.S. Cl.
CPC ...
Abstract
A sulfonic acid onium salt represented by the following formula (1) can be used as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt. In formula (1), Rrepresents a monovalent organic group, and Qrepresents a sulfonium cation or iodonium cation.