The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2013
Filed:
Jan. 27, 2011
Guowen Ding, San Jose, CA (US);
Herrick NG, Cupertino, CA (US);
Teh-tien Sue, Milpitas, CA (US);
Benjamin Schwarz, San Jose, CA (US);
Zhuang LI, San Jose, CA (US);
Guowen Ding, San Jose, CA (US);
Herrick Ng, Cupertino, CA (US);
Teh-Tien Sue, Milpitas, CA (US);
Benjamin Schwarz, San Jose, CA (US);
Zhuang Li, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods of processing substrates having metal layers are provided herein. In some embodiments, a method of processing a substrate comprising a metal layer having a patterned mask layer disposed above the metal layer, the method may include etching the metal layer through the patterned mask layer; and removing the patterned mask layer using a first plasma formed from a first process gas comprising oxygen (O) and a carbohydrate. In some embodiments, a two step method with an additional second process gas comprising chlorine (Cl) or a sulfur (S) containing gas, may provide an efficient way to remove patterned mask residue.