The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2013
Filed:
Apr. 05, 2010
Applicants:
Jae Wan Hong, Seoul, KR;
Won Young Song, Incheon, KR;
Inventors:
Jae Wan Hong, Seoul, KR;
Won Young Song, Incheon, KR;
Assignee:
Nanofocus, Inc., Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01Q 60/24 (2010.01);
U.S. Cl.
CPC ...
Abstract
Provided are an AFM measuring method and a system thereof. The tip of a cantilever is provided to a plurality of points on a substrate, to which incident light is radiated from a light source. Scattered light is generated between the tip of the cantilever and the substrate by the incident light and the intensity of the scattered light is measured. The measured intensity of the scattered light is input to a data processing unit so as to find a point where the intensity of the incident is highest. The tip of the cantilever is moved to the point where the intensity of the incident light is highest.