The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 30, 2013

Filed:

Apr. 09, 2012
Applicants:

Le-tien Jung, New Taipei, TW;

Tai-sheng Feng, Hsinchu, TW;

Inventors:

Le-Tien Jung, New Taipei, TW;

Tai-Sheng Feng, Hsinchu, TW;

Assignee:

Taiwan Memory Company, Hsinchu, TW;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/4763 (2006.01); H01L 21/44 (2006.01); H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
Abstract

A manufacturing method for a buried circuit structure includes providing a substrate having at least a trench formed therein, forming a firs conductive layer on the substrate blanketly, forming a patterned photoresist having a surface lower than an opening of the trench in the trench, removing the first conductive layer not covered by the patterned photoresist to form a second conductive layer having a top lower than an opening of the trench in the trench, removing the patterned photoresist, performing a dry etching process to remove the second conductive layer from the bottom of the trench to form a third conductive layer on the sidewalls of the trench, performing a selective metal chemical vapor deposition to form a metal layer having a surface lower than a surface of the substrate, and forming a protecting layer filling the trench on the metal layer.


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