The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2013
Filed:
Aug. 20, 2012
Gisela Von Blanckenhagen, Aalen, DE;
Gisela Von Blanckenhagen, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
In order to produce stress-reduced reflective optical elements () for an operating wave length in the soft X-ray and extreme ultraviolet wavelength range, in particular for use in EUV lithography, it is proposed to apply, between substrate () and a multilayer system () optimized for high reflectivity at the operating wavelength, a stress-reducing multilayer system () with the aid of particle-forming particles having an energy of 40 eV or more, preferably 90 eV or more. Resulting reflective optical elements are distinguished by low surface roughness, a low number of periods in the stress-reducing multilayer system and also highvalues of the stress-reducing multilayer system.