The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2013
Filed:
Nov. 24, 2010
Toru Shirasaki, Annaka, JP;
Kenichi Fukuda, Annaka, JP;
Toru Shirasaki, Annaka, JP;
Kenichi Fukuda, Annaka, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
A pelliclefor lithography includes a pellicle frame, a pellicle membraneadhered onto the upper end surface of the pellicle frameand an agglutinant layerformed on the lower surface of the pellicle frameand the agglutinant layeris formed by hardening a curable composition containing a straight chain perfluoro compound having a perfluoro structure in a main chain. The thus constituted pelliclegenerates only a small amount of a decomposition gas even when it is used for a long time, thereby preventing solid-like foreign materials from separating out on a pattern region of a photomaskand can suppress degradation of an the agglutinant agent contained in an agglutinant layerto be used for fixing a photomaskto the pellicle frame. Further, this pelliclecan be easily peeled off from a photomaskand replaced with a new one.