The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2013
Filed:
Dec. 15, 2011
Applicant:
Shing-hwa Renn, Taipei, TW;
Inventor:
Shing-Hwa Renn, Taipei, TW;
Assignee:
Nanya Technology Corp., Kueishan, Tao-Yuan Hsien, TW;
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for aligning a wafer stack includes providing a wafer stack including a top wafer with a top mark and a bottom wafer with a bottom mark in particular the top mark and the bottom mark capable of corresponding to each other; adjusting a relative position between the top wafer and the bottom wafer so that the top mark and the bottom mark are in contact with each other; applying an electrical signal on the top mark to obtain an electrical reading and optimizing the electrical reading to substantially align the wafer stack.