The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 16, 2013

Filed:

Jul. 17, 2012
Applicants:

Yu-lun Chueh, Hsinchu, TW;

Tsung-cheng Chan, Hsinchu, TW;

Chien-neng Liao, Hsinchu, TW;

Inventors:

Yu-Lun Chueh, Hsinchu, TW;

Tsung-Cheng Chan, Hsinchu, TW;

Chien-Neng Liao, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 3/00 (2006.01); C23C 14/14 (2006.01); C21D 6/04 (2006.01); C21D 1/09 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for forming a metal film with twins is disclosed. The method includes: (a) forming a metal film over a substrate, the metal film being made of a material having one of a face-centered cubic crystal structure and a hexagonal close-packed crystal structure; and (b) ion bombarding the metal film at a film temperature lower than −20° C. in a vacuum chamber and with an ion-bombarding energy sufficient to cause plastic deformation of the metal film to generate deformation twins in the metal film.


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