The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 09, 2013

Filed:

Aug. 30, 2010
Applicants:

Katsuya Okumura, Tokyo, JP;

Katsuji Kadosawa, Tokyo, JP;

Tomofumi Kiyomoto, Takatsuki, JP;

Motohiro Suyama, Hamamatsu, JP;

Atsushi Ishii, Hamamatsu, JP;

Inventors:

Katsuya Okumura, Tokyo, JP;

Katsuji Kadosawa, Tokyo, JP;

Tomofumi Kiyomoto, Takatsuki, JP;

Motohiro Suyama, Hamamatsu, JP;

Atsushi Ishii, Hamamatsu, JP;

Assignees:

Tokyo Electron Limited, Tokyo, JP;

Hamamatsu Photonics K.K., Hamamatsu-shi, Shizuoka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 35/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

A target for X-ray generation has a substrate and a target portion. The substrate is comprised of diamond and has a first principal surface and a second principal surface opposed to each other. A bottomed hole is formed from the first principal surface side in the substrate. The target portion is comprised of a metal deposited from a bottom surface of the hole toward the first principal surface. An entire side surface of the target portion is in close contact with an inside surface of the hole.


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