The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2013
Filed:
Apr. 08, 2010
Erik Henricus Egidius Catharina Eummelen, Veldhoven, NL;
Koen Steffens, Veldhoven, NL;
Takeshi Kaneko, 's-Hertogenbosch, NL;
Gregory Martin Mason Corcoran, Eindhoven, NL;
Erik Henricus Egidius Catharina Eummelen, Veldhoven, NL;
Koen Steffens, Veldhoven, NL;
Takeshi Kaneko, 's-Hertogenbosch, NL;
Gregory Martin Mason Corcoran, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A fluid handling system for an immersion lithographic apparatus that has a fluid removal device to remove immersion liquid from an immersion space, and a droplet removal device to remove a droplet of immersion liquid, wherein: the droplet removal device is located further from an optical axis than the fluid removal device, and the droplet removal device comprises a porous member which faces, e.g., the substrate being exposed and/or the substrate table.