The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 09, 2013

Filed:

Jan. 14, 2010
Applicants:

Mukta G. Farooq, Hopewell Junction, NY (US);

Emily R. Kinser, Hopewell Junction, NY (US);

Richard Wise, Hopewell Junction, NY (US);

Hakeem Yusuff, Hopewell Junction, NY (US);

Inventors:

Mukta G. Farooq, Hopewell Junction, NY (US);

Emily R. Kinser, Hopewell Junction, NY (US);

Richard Wise, Hopewell Junction, NY (US);

Hakeem Yusuff, Hopewell Junction, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/425 (2006.01); H01L 21/4763 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method includes patterning a photoresist layer on a structure to define an opening and expose a first planar area on a substrate layer, etching the exposed planar area to form a cavity having a first depth in the structure, removing a second portion of the photoresist to expose a second planar area on the substrate layer, forming a doped portion in the second planar area, and etching the cavity to expose a first conductor in the structure and the doped portion to expose a second conductor in the structure.


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