The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2013
Filed:
Nov. 12, 2010
Dujiang Wan, Fremont, CA (US);
Hai Sun, Milpitas, CA (US);
GE Yi, San Ramon, CA (US);
Wei Gao, Fremont, CA (US);
Hong Zhang, Fremont, CA (US);
Guanghong Luo, Fremont, CA (US);
Yunjun Tang, Pleasanton, CA (US);
Tiffany Yun Wen Jiang, San Francisco, CA (US);
Zhigang Zhou, San Ramon, CA (US);
Wencheng Su, Cupertino, CA (US);
Dujiang Wan, Fremont, CA (US);
Hai Sun, Milpitas, CA (US);
Ge Yi, San Ramon, CA (US);
Wei Gao, Fremont, CA (US);
Hong Zhang, Fremont, CA (US);
Guanghong Luo, Fremont, CA (US);
Yunjun Tang, Pleasanton, CA (US);
Tiffany Yun Wen Jiang, San Francisco, CA (US);
Zhigang Zhou, San Ramon, CA (US);
Wencheng Su, Cupertino, CA (US);
Western Digital (Fremont), LLC, Fremont, CA (US);
Abstract
A method and system for fabricating a microelectric device are described. A write pole of an energy assisted magnetic recording head or a capacitor might be fabricated. The method includes depositing a resist film and curing the resist film at a temperature of at least 180 degrees centigrade. A cured resist film capable of supporting a line having an aspect ratio of at least ten is thus provided. A portion of the cured resist film is removed. A remaining portion of the resist film forms the line. An insulating or nonmagnetic layer is deposited after formation of the line. The line is removed to provide a trench in the insulating or nonmagnetic layer. The trench has a height and a width. The height divided by the width corresponds to the aspect ratio. At least part of the structure is provided in the trench.