The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 02, 2013

Filed:

Jan. 17, 2008
Applicants:

Shahin Zangooie, Hopewell Junction, NY (US);

Lin Zhou, LaGrangeville, NY (US);

Roger M. Young, Warwick, NY (US);

Clemente Bottini, Marlboro, NY (US);

Ronald D. Fiege, Hopewell Junction, NY (US);

Inventors:

Shahin Zangooie, Hopewell Junction, NY (US);

Lin Zhou, LaGrangeville, NY (US);

Roger M. Young, Warwick, NY (US);

Clemente Bottini, Marlboro, NY (US);

Ronald D. Fiege, Hopewell Junction, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods, apparatuses and systems for monitoring a stage alignment in a processing system are disclosed. A method for monitoring a stage alignment in a processing system may include providing a calibration target on a surface of the stage; measuring an angle of incident of a light beam to the calibration target; and monitoring the stage alignment based on the determined angle of incidence.


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